×

Notificare

EU e-Privacy Directive

This website uses cookies to manage authentication, navigation, and other functions. By using our website, you agree that we can place these types of cookies on your device.

View e-Privacy Directive Documents

View GDPR Documents

You have declined cookies. This decision can be reversed.

C. Vitelaru, D. Lundin, N. Brenning, T. Minea, Plasma reactivity in high-power impulse magnetron sputtering through oxygen kinetics, APPL PHYS LETT, vol. 103, pp. 104105-104109, http://dx.doi.org/10.1063/1.4819835, 2013

Title: Plasma reactivity in high-power impulse magnetron sputtering through oxygen kinetics

Abstract: 

The atomic oxygen metastable dynamics in a Reactive High-Power Impulse MagnetronSputtering (R-HiPIMS) discharge has been characterized using time-resolved diode laserabsorption in an Ar/O2 gas mixture with a Ti target. Two plasma regions are identified: theionization region (IR) close to the target and further out the diffusion region (DR), separated by a transition region. The μs temporal resolution allows identifying the main atomic oxygen production and destruction routes, which are found to be very different during the pulse as compared to the afterglow as deduced from their evolution in space and time.