D. Ghica, C.  Ghica, M. Gartner, V. Nelea, C. Martin, A.  Cavaleru, I.N. Mihailescu, Pulsed laser deposition of lithium niobate: a parametric study, Applied Surface Science, 138 (1999) 617-621


Title: Pulsed laser deposition of lithium niobate: a parametric study

Abstract: We report the deposition of high optical quality LiNbO(3) thin films on Si(lll) substrates by pulsed laser ablation using a KrF* excimer laser (lambda = 248 nm, tau = 20 ns) source. Experiments have been conducted in oxygen at 5-20 Pa. Si(lll) collectors were uniformly heated at 500-700 degrees C. Some of the as-deposited collectors were submitted to an in-situ thermal treatment in oxygen (10(3)-10(4) Pa) at the same temperature. The deposited thin films were characterised by grazing incidence X-ray diffraction (GIXRD), transmission electron microscopy (TEM) and spectroscopic ellipsometry (SE). Our LiNbO(3) thin films, achieved at relatively low temperature (550 degrees C), are the first textured and high optical quality pulsed laser deposited films on Si.

Keywords: pulsed laser deposition; LiNbO(3) thin films

Author: D. Ghica

Tuesday the 23rd. Copyright © INOE 2012
Implemented by networks