C. E. A. Grigorescu, L. Torte, O. Monnereau, L. Argeme, H. J. Trodahl, S. Granville, A. Bittar, F. Budde, B. J. Ruck, G. V. M. Williams, G. Pavelescu, A. Tonetto, R. Notonier, C. Logofatu, Structural and optical properties of GaN-based nanocrystalline thin films, Thin Solid Films, 516/ 7 (2008) 1617 - 1621


Title: Structural and optical properties of GaN-based nanocrystalline thin films

Abstract: We study the effect of annealing on structure, morphology and optical properties of nanocrystalline films of GaN, GaN:O and GaN:Mn prepared by ion assisted deposition on silicon, quartz and glassy carbon substrates. Blisters and holes having diameters proportional with the thickness of the film were observed in GaN:O deposited on silicon and glassy carbon. The Mn excess in GaN:Mn turns through annealing into MnxNy islands. The degree of short- and intermediate-range order in the films was investigated by micro-Raman spectroscopy, extending to about 3 nm for gallium oxynitride films annealed to 973 K and to more than 10 nm in GaN samples. A diminished oxygen content following the annealing procedures on GaN:O samples is noticed from the reduced intensity of the oxygen mode at 1000 cm(-1) in the Raman spectra. This observation is supported with X-ray photoemission spectroscopy measurements. The presence of oxygen at concentrations above 15at.% in the films leads to an abrupt nanocrystalline-amorphous transition

Key words: ion assisted deposition; gallium nitride; annealing; scanning electron microscopy; X-ray diffraction; X-ray photoemission spectroscopy; Raman spectroscopy; short range order